Dynamical modeling of bi-layer Aluminium adhesive tape for laser shock applications

M. Ayad (1) , S. Ünaldi (1) , M. Scius-Bertrand (2) , C. Le Bras (3) , B. Fayolle (1) , L. Berthe (1)

1 PIMM - Laboratoire Procédés et Ingénierie en Mécanique et Matériaux
2 RESCOLL (FRANCE)
3 CELIA - Centre d'Etudes Lasers Intenses et Applications

The presented work covers the response of Aluminium tape (Al tape) under high strain rate of deformation (order of ) using laser shock. High power laser (J) with a short pulse duration (ns) is used to create laser shock within the water confinement regime on two Al tape configurations in order to apply low and high pressure (order of MPa and GPa). Al tape has been modeled using Johnson-Cook (J-C) material model for the Al layer, and Steinberg–Cochran–Guinan (SCG) material model (elastic with pressure dependence) for the adhesive layer, both material models are coupled with Grüneisen equation of state. The Al tape model has been validated by comparing the simulated Back Face Velocity (BFV) of the target with the measured one by the Velocity Interferometer System for Any Reflector (VISAR). In addition, the validated material model is used to conduct the sensitivity studies about the transmitted pressure depending on the acoustical impedance of the target and adhesive thickness. Moreover, location and magnitude of maximum tensile stress within the target are calculated in function of the adhesive thickness of the Al tape. Finally, it has been proved that using one laser beam configuration, maximum tensile zone could appears close to the front face by increasing the adhesive thickness.

Mots clés: Laser shock; Dynamic material characterization; Polymer glassy behavior; High strain rate; Johnson–Cook; Steinberg–Cochran–Guinan; Laser shock

Domaines: Sciences de l'ingénieur [physics]; Matériaux; Mécanique [physics]; Optique [physics.optics]

M. Ayad, S. Ünaldi, M. Scius-Bertrand, C. Le Bras, B. Fayolle, et al.. Dynamical modeling of bi-layer Aluminium adhesive tape for laser shock applications. Optics and Laser Technology, 2023, 163, pp.1-10. ⟨10.1016/j.optlastec.2023.109366⟩. ⟨hal-04097265⟩